FACILITIES

Fume-Hood

Inorganic and organic Synthesis, Possibility of reaction under vacuum and inert atmosphere, Synthesis of organic and inorganic functional sensitizers and Measurement of Fuel cell Performance.

Rotary evaporators

反応時に使用した溶媒除去に使用する装置
減圧蒸留が可能で、真空ポンプ・冷却トラップを備えており高沸点溶媒の除去も可能

High Performance Liquid Chromatography (HPLC)

Analytical HPLC equipped with UV and Photodiode Array detectors; Characterization of intermediates, impurities and final products. Determination of purity of final products. Utilization of PDA detector allows the real monitoring of impurities and products by simultaneous measurement of electronic absorption spectra.

Liquid Chromatography-Mass Spectrometry (LC-MS)

Equipped with ESI and APCI probes for fast detection of mass fragments of organic molecules with various polarities. Simultaneous detection of positive and negative ion mode. Used for identification of intermediates and final products by mass analysis.

Gas Chromatography (GC)

島津製作所

Instrument used for detection and identification intermediates and products in the gas phase.

Electronic Absorption Spectroscopy

[V-570, V550, JASCO]

Instrument used for measurement absorption spectra in UV-visible and infra-red wavelength region. Possible to use both of solid and liquid samples. Used characterization of materials based on there characteristic electronic transitions qualitatively as well as quantitatively.

Fourier Transform Infrared Spectroscopy (FT-IR)

FT/IR-4100, JASCO

Used for characterization of molecules based their characteristic bond vibration. Both solid powder and thin films can be measured in transmission mode as well as reflection (Attenuated total reflectance ATR) modes.

Fluorescence Spectrophotometer

FP-6500, JASCO

Instrument associated with measurement of Fluorescence spectra in solution and coated on film after their excitation at desired wavelength from 200-750 nm.

Time Correlated Single Photon Counting Fluorescence Lifetime Measurement (TCSPC)

Quantaurus-Tau C-11367, Hamamatsu Photonics

7 types of LED based light source for excitation, measurement from 300-800 nm, Measurement in solid and liquid state, Very compact and equipped with user friendly control and analysis software. Being used design and development of new sensitizers for solar cells. Able to measure fluorescence life-time > 100 ps.

近赤外対応ナノ秒時間分解分光測定装置
(レーザーフラッシュホトリシス)
(Time-resolved Absorption Spectroscopy, Nanosecond Laser Flash Photolysis )

ユニソク:TSP-2000SLO-NIR25

マテリアルの光吸収、発光をプローブ光としてとらえ、対象物質の高速反応を把握する装置、励起光源(ポンプ光)に短パルスYAGレーザーを使用し、OPO(光パラメトリック発振器)により任意の励起波長が選択可能、分光器による単一波長及びマルチチャンネルの自動測定が可能であり、Si及び、InGaAs光検出器で波長350～2500nmまでのプローブ光を最少OD感度0.0001で測定可能

Differential Scanning Calorimetry and Thermo-Gravimetric Analysis (DSC/TG-DTA)

DTG-60/DSC-60, Shimazu

Instruments associated with the investigation of thermal properties of materials. Currently being used for the measurement thermal stability, melting and degradation temperature and phase changes during thermal cycles

Time of Flight (TOF) Measurement

TOF-401, OPTEL

Instrument dedicated for investigation of photocarrier transport in photofunctional materials. Estimation of carrier mobility, Field dependence of the carrier mobility and temperature dependence of the carrier mobility.

Thermally Stimulated Current (TSC)

TS-FETT, Rigaku

This system is capable of measuring the very small current in the range of Femto-ampere resulting from the change of the trap States due to differences of crystal defects and impurities. Out put current associated with Escape of the trap is closely related with sub-surface impurity States and defects. Such measurements provide the information of micro structure and electronic States by analysis of the trap profile in the material.

Quartz Crystal Microbalance with Dissipation Monitoring (QCM-D)

QCM-D E1, Q-Sens

This system is capable of simultaneous measurement of QCM resonance frequency as well as dissipation or damping of its oscillations during the adsorption of molecules on the sensor surfaces, quantatitavely. By frequency change, we can determine amount of deposited materials while the by the dissipation monitoring we can have information about the viscoelasticity leading to information about the molecular rigidity or softness on the surface.

Contact Angle Meter

DCA-VZ, Kyowa

Measure the wettability, permeability, water repellency, adhesion, etc. of Liquid-solid interface.

Inert Atmosphere Glovebox System

UNILab, MBrown

This system is being used for device fabrication under inert atmosphere having precisely controlled oxygen (<0.1 ppm) and moisture (<1 ppm). This system is connected with the 8 source thermal evaporation system leading to complete fabrication and sealing of the device under inert atmosphere.

Simple Glaobe Box
(Glovebox)

As one

Simple compact glove box for purge gas replacement. Spin coating and drying of materials requiring humidity control are performed in a box.

Thermal Evaporation System

E-200, ALS Technology

Left hand side is 8 source thermal evaporation system with load and lock capability. Any kind of organic and inorganic materials can be successfully deposited with dual thickness monitoring.

Vacuum Evaporation system

VPC-260, Ulvac

Resistance heating vacuum evaporation system using rotary pump and oil diffusion pump. As there many flange ports, any modification is possible.

Load-lock Sputtering System

CFS-4EP-LL, Shibaura

This is a load-lock RF sputtering apparatus having three independent surces.

Nano Vapor Spray Deposition

STS-200

This is special type of nano-vapor spray deposition system containing computer controlled nozzle and stage movements. It has a two nozzles enabling the simultaneous coating of two different materials. The temperature of the substrate holding stage can be controlled from room temperature to 500oC. Un spin coater with 90 % material wastage, this system has very high (about 90 %) material utilization.

Arc Plasma Deposition System

アルバック:APDT-1S

パルスアーク放電により、Arなどのプロセスガスを使用せずにターゲットにプラズマを発生させる。基板温度を上昇させずにイオン化された蒸着粒子を平坦かつ均一な薄膜で形成することが可能

Nanofiber Electospinning Unit

KatoTech

The syringe tip is positive electrode, the substrate is placed on a flat negative electrode, and a high voltage of kV order is applied between the two electrodes. As a result, charged partocles and polymer are released from the syringe and attracted to the negative alectrode to form a fibrous film on the substrate.

Screnn-printing Machine

ニューロング精密工業:DP-320

卓上タイプの自動塗工印刷機

Manual Printing Machine

ミタニマイクロニクス:MEC-2400

メタルマスクを使用したスキージ塗布や、メッシュスクリーンによるスクリーン印刷を手動で行う

Spin Coater

1H-DX2(Upper left), Mikasa; MS-100(Upper right)
CZ-650(Lower left), Laurell; SC-150(Lower right)

The low viscosity ink is cast, and thin film formation and drying are simultaneously performed while rotating the substrate at high speed. Installed at multiple locations, such as in a glove box.

Nano Dip Coater

ND-0407, SDI

It is high precision dip coating machine which can precisely perform the dipping of the head up to 1 micrometer/second.

Low Pressure Plasma System

FEMTO, Diener Electronic

Soft Pressure Plasma Etching

SEDE-GE, Meiwafosis

This is basically a low pressure plasma system and can be utilized for the cleaning, activation and etching of th surface under investigation. At the same time, it can also be used for surface plasma polymerization.

UV-ozone Cleaner 

UV-253, Filgen

Dry cleaning system with UV and Ozone. Decomposing organic pollitants by ultraviolet light, the active oxygen separated from the generated ozone combines with the decomposed pollutants, perform cleaning by becoming volatile substances such as carbon dioxide and water.

Muffle Furnace

We can perform programmed heating for different materials from RT to 1000oC. In our laboratory it is mainly being used for preparation metal-oxides electrodes like TiO2, SnO2, WO3 to fabricate the photoanodes of the dye-sensitized solar cells.

Water Purification System

PURELAB Prima and flex, ELGA

Used in synthesis and washing.

Compact Roll Press Machine

テスター産業:SA-601

ロール間距離調節方式の、ロールプレス機
圧延、圧着に使用

Precision Saws

BUEHLER:アイソメット1000

ホイールダイヤモンドソーで、樹脂・金属・セラミックを精密切断することが可能、SEM観察試料作製などに使用する

Ultra Apex Mill

UAM015

This machine is being used for the fabrication of homogenous slurry of the nanoparticles to prepare the high quality screen printable paste for the fabrication of dye-sensitized solar cells.